0.35μm相移掩模模拟计算及软件设计

Simulation and Software Design of 0.35μm Phase Shift Masks

首先通过对０．３５μｍ 接触方孔在不同相移掩模情况下硅片表面空间象光强分布的模拟计算，得出不同相移掩模情况下的最优相移参数。在几种相移掩模中，衰减型对提高边缘斜率最为明显，因此我们决定采用衰减型相移掩模。最后编制了相应的实用化软件，该软件能够自动生成各种相移掩模并能够模拟计算不同照明参数、不同掩模、不同数值孔径、不同离焦情况下的空间象分布。

The optimal phase shift parameters with the different phase shift masks(PSM) are obtained through the simulating calculation of the light intensity distri butions of aerial images projected on wafer surface which pass through the different phase shift masks with 0.35μm square contact hole.Attenuation type phase shift mask among the several phase shift masks is the most obvious in improvement of the edge resolution,so we have decided to adopt it.The corresponding software is programmed in the end.Various phase shift masks can be produced by the software.The distributions of the aerial images produced under the different illuminating parameters,different masks,different number apertures and different defocusing cases can be calculated and simulated.The related laser direct writing data in making mask can be directly produced.