摘要
采用多光子吸收电离模型讨论了光学薄膜的激光诱导损伤与其材料带隙的关系，分析了实际光学薄膜存在大量的非化学计量比化合物缺陷时，损伤阈值的变化，给出了光学薄膜的损伤阈值与其材料带隙的关系曲线。
The relations between the laser induced damage to optical thin film and the material band gap are discussed by use of the model of multiphoton absorption ionization in the paper.The variation of the damage threshold while a lot of non stoichiometric compound defects exist in the realistic optical thin film is analyzed.The relation curve of the damage threshold of the optical thin film and its material band gap are given.The main reason which the damage threshold of the realistic optical thin film is lower than that of the ideal optical thin film may be large numbers of non stoichiometric compound defects exist in the realistic optical thin film.
出处
《光电工程》
EI
CAS
CSCD
1999年第4期58-62,68,共6页
Opto-Electronic Engineering
基金
中国工程物理研究院行业科技预研基金
关键词
光学薄膜
激光诱导
激光损伤
材料缺陷
Optical thin films,Laser induction,Laser damage,Material defect.
