高压及热处理对氮碳薄膜激光诱导荧光效率的影响

EFFECTS OF HIGH PRESSURE AND THERMAL TREATMENTS ON PHOTOLUMINESCENCE EFFICIENCY OF CN x FILMS

应用激光激发荧光光谱实验对经热处理后及高压条件下的氮碳薄膜荧光光谱进行了测量分析。实验显示，热处理效应和高压效应均导致薄膜荧光效率降低，前者表现为不可恢复，后者为可恢复即卸压后荧光效率的恢复，表明导致荧光光谱效率降低的微观机制不同，为氮碳薄膜荧光模型提供了新的实验证据。

Laser induced photoluminescence of carbon nitride films was measured under high pressures up to 24GPa and after thermal treatment at different temperatures.The experimental results show that both effects of thermal treatment and high pressure induce the decrease of photoluminescence strength,but the former is non recoverable while the later recoverable after release of pressure to ambient atmosphere.The two kinds of quenching of photoluminescence are attributed to different mechanism.Our results supply a further experimental evidence to support the active PL center model of the undistorted aromatic sp 2 cluster with various size and embedded in sp 3 bond matrix.