摘要
利用射频磁控溅射技术在石英玻璃衬底上制备掺Al氧化锌(AZO)薄膜,研究了不同溅射功率(75,120,160,200 W)对AZO薄膜的结构、光学和电学特性的影响。结果表明:所制备的AZO薄膜具有良好的c轴择优取向,且随着溅射功率的增加,薄膜的表面颗粒尺寸逐渐增加;薄膜在可见光范围具有较高的透射率,吸收边在350~400 nm波段;随着溅射功率的增加,载流子浓度和迁移率逐渐增大,电阻率逐渐下降。
The Al-doped ZnO(AZO) films are deposited on glass using RF magnetron sputtering technology under different sputtering power:75,120,160,200 W.The effect of sputtering power on the structural,optical and electrical properties of the AZO films is investigated.The results indicate each of the films has a preferential c-axis orientation and the surface grain size increases with sputtering power increasing.All the films exhibit a high transmittance in visible region and have sharp fundamental absorption edge in the wavelength range of 350~400 nm.The resistivity decreases as sputtering power increases,both carrier concentration and Hall mobility increase.
出处
《传感器与微系统》
CSCD
北大核心
2011年第6期36-38,共3页
Transducer and Microsystem Technologies
基金
安徽省高等学校省级优秀青年人才基金资助项目(2010SQRL094)
安徽建筑工业学院硕博科研启动基金资助项目(2009-09-04)
关键词
AZO薄膜
磁控溅射
透射率
电阻率
AZO film
magnetron sputtering
transmittance
resistivity