ODF工艺中液晶滴下量的优化

Optimization of LC Drop Amount in ODF and PS Process

研究了小尺寸液晶显示器件ODF(One Drop Filling)工艺中液晶滴下量对漏液晶和低温气泡的影响,确定了液晶滴下量的安全范围。开发了液晶滴下设备与PS高度检测设备联动的新型液晶滴下方法,有效地解决了PS产品在ODF工艺中发生漏液晶和低温气泡的问题。

The impact of the LC dropping amount on the LC leak and cold bubble in the ODF process was researched,and the safe scope of the LC dropping amount was found out.Then,a new method to realize the ODF and PS linkage was developed,which can effectively solve LC leak and cold bubble problem of PS production in the ODF process.