O(~3P)原子和硅烷化学反应动力学研究

THE KINETIC STUDY OF REACTION O(~3P) AND SILANE

本文报道了用流动放电-化学发光技术测定O(~3P)和硅烷化学反应速率常数.在293—413K范围内,结果为k=(1.05±0.36)×10^(-10)exp[(-3.06±0.10)kcal. mol^(-1) /RT]cm^3·molecule^(-1)·s^(-1)并用过渡态理论将上述实验结果外推到200—2000K范围内.计算结果以三参数公式表示为: k=7.67×10^(-19) T^(2.59) exp(-720cal.mol^(-1)/RT)cm^3·molecule^(-1)·s^(-1).

The measurement of rate constant of reaction O^3(P) + SiH_4 with discharge flow-chemiluminescence technique is presented. The Arrhenius form of the rate constantover temperature range 293--413K is k= (1.05±0.36)×10^(-10)exp[(-3.06±0.10)kcal·mol^(-1)/RT]cm^3·molecule^(-1)·s^(-1)Using transition-state theory, the result was extrapolated to temperature range of 200--2000K. The calculated dependence of the rate constant on temperature with threeparameters isk = 7.67×10^(-19)T^(2.59)exp (-720cal·mol^(-1)/RT)cm^3·molecule^(-1)·s^(-1).