摘要
我们运用现场光谱电化学方法研究了α－巯基苯并噻唑对铜的缓蚀机理。研究表明α－巯基苯并噻唑是通过在金属铜表面形成一层致密的非水溶性配合物膜ＣｕⅠ－ＭＢＴ而起缓蚀作用的。
The mechanism of the corrosion inhibition of copper by mercaptobenzothiazole (MBT) was investigated by in situ spectro electrochemical method. The results showed that Cu(Ⅰ) MBT formed on the surface of Cu by a surface reaction of cuprous ion with MBT performed as a barrier aganist corrosive envirronments.
出处
《无机化学学报》
SCIE
CAS
CSCD
北大核心
1999年第6期756-760,共5页
Chinese Journal of Inorganic Chemistry
关键词
光谱电化学
巯基苯并噻唑
缓蚀剂
铜
MBT
spectro electrochemistry mercaptobenzothiazole(MBT) anticorrosive copper
