摘要
基于两体碰撞近似,本文用蒙特-卡罗方法研究离子轰击多成分靶引起的溅射。计算了1keV,10keV的氦离子和氖离子入射引起多成分、无定型靶表面总溅射产额和部分溅射产额;溅射粒子的能谱、角分布和深度来源分布。并计算了择优溅射引起材料表面组分相对浓度的变化。结果还表明,离子轰击多成分靶时,碰撞效应足以引起优先溅射,它是造成靶表面各种成分相对浓度变化的重要因素。
Based upon the binary collision approximation (BCA), the Monte Carlo methods are employed to study sputtering of multi-component amorphous targets. Total and partial sputtering yields, energy and angular distribution and the escape depth distribution of sputtered particles are given. The changes of surface concentrations are also studied The results indicate that the collisional effect may account for t'he preferential sputtering, which plays an important role in surface composition changes due to ion bombardment.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1990年第2期319-324,共6页
Acta Physica Sinica
基金
863高技术科学基金资助的课题
