摘要
本文对等离子体气相沉积法制备的类金刚石膜(a-C:H)进行了离子注入研究。注入剂量固定为5×10~5Ar/cm^2,注入能量分别为50,100,140和180keV。离子注入前后分别作了红外吸收谱,Raman谱,光学能隙,氢含量和电阻率的测量。结果表明,注入离子破坏了膜中的C—H键,sp^2和sp^3态都减少,而(sp^2/sp^3)比值增大;光学能隙E_(opt),电阻率以及氢含量随着注入离子能量的增加而减少,而在180keV时,不再有明显变化。文中对上述结果进行了分析和讨论。
Diamond-like carbon (DLC) films, prepared by RF plasma CVD, were implanted at a dose of 5×10^(15)Ar/cm^2 with various ion energy of 50, 100, 140, 180 keV. Before and after ion implantation, IR absorption spectra, Raman spectra, optical gap E_(0pt), hydrogen contents and resistivities were measured. The results show that C-H bonds are destroyed and sp^2 and sp^3 components are decreased during implantation. While the ratio of (sp^2/sp^3) increases with ion energy. The EoPt, resistivities and hydrogen contents decrease with ion energy increasing. Ho-wever, at 180 keV, the above parameters have no evident change. These results are also discussed in this paper.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1990年第3期420-423,共4页
Acta Physica Sinica