墙地砖抛光机磨削均匀性分析及建模

THE STUDY AND MODELING OF THE GRINDING EVENNESS OF CERAMIC TILE POLISHER

通过对影响陶瓷墙地砖抛光机磨削均匀性的多方面因素进行了分析 ,并建立了磨削均匀性的数学模型 ,该模型反映了抛光机各运动参数和几何参数对磨削均匀性的影响 ,并从抛光工艺的角度提出解决磨削均匀性问题的方法。

A grinding evenness model which indicate the affection on grinding evenness by the motive and geometric parameters is build up,through analized the grinding process of ceramic tile polisher.Then,the method to improve the grinding evenness is brought forward.