摘要
分析了CVD金刚石薄膜的界面能量情况,并由此研究了金刚石成核几率、晶核取向。
Interfacial energy during CVD diamond films was analysed. The relationship of diamond nucleation probability, nucleus orientations and film adhesion with structure ad properties was investigated.
出处
《湘潭大学自然科学学报》
CAS
CSCD
1999年第4期44-47,共4页
Natural Science Journal of Xiangtan University
关键词
CVD
成核几率
附着强度
金刚石薄膜
界面能量
CVD diamond,nucleation probability,nucleus orientation,adhesion strength,substrate materials
