成膜工艺对sol-gel电致变色WO_3薄膜的影响

Effects of film forming techniques on the electrochromic property of sol-gel derived WO_3 films

以钨粉过氧化聚钨酸法配制溶胶,采用脉冲电泳沉积和浸渍提拉两种工艺在ITO导电玻璃基底上制备电致变色WO3薄膜,研究溶胶-凝胶成膜工艺对WO3薄膜微观结构、光学性能和电化学性能的影响.结果表明,两种成膜工艺制备的WO3薄膜均呈非晶态,薄膜厚度相近,约为252 nm.与浸渍提拉法相比,脉冲电泳沉积制备的薄膜具有更大的光学调制幅度,在可见光范围内可达80%,比浸渍提拉制备的薄膜高25%.脉冲电泳沉积制备的薄膜具有更高的电化学活性和更快的时间响应,但其循环可逆性相对较低.

A sol made through peroxopolytungstic acid method was employed for the deposition of elec- trochromic WO3 films by pulse electrophoretic depositing and dip coating techniques on ITO glass substrates. Effects of films forming techniques on the microstructure, optical and electrochemical properties of sol - gel derived WO3 films were studied. WO3 films prepared by the two film forming tech-niques are composed of amorphous phase, and both films have similar thickness - 252 nm. The transmission modulation for W03 films prepared by pulse electrophoretic depositing can be up to 80% in the visible region, which is 25% higher than the dip coated films. The pulse electrophoretic deposited WO3 films exhibit higher electrochemical activity, faster response, and relatively lower reversibility compared with the dip coated WO3 films.