沉积气压对电弧离子镀制备MgO薄膜的结构及性能的影响

Influences of deposition pressure on the structure and properties of MgO thin films prepared by cathodic vacuum arc deposition

采用阴极真空电弧离子沉积技术在玻璃及Si衬底上成功地制备了具有择优结晶取向的透明MgO薄膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)及紫外-可见吸收光谱仪分别对MgO薄膜微观结构、表面形貌及可见光透过率进行了测试与分析。XRD结果表明,所制备的MgO薄膜具有NaCl型立方结构的(100)、(110)和(111)3种结晶取向,在沉积气压为0.7～3.0Pa的范围内,薄膜的择优结晶取向随沉积气压的升高先由(100)转变为(110),最后变为(111)。SEM图表明随着沉积气压的升高,MgO薄膜的晶粒逐渐变小,薄膜结晶质量变差。在380～900nm范围内,沉积气压为0.7Pa下制备的MgO薄膜其可见光透过率高于90%,随着沉积气压的升高,薄膜的可见光透过率有所下降。

MgO thin films with preferred orientation and high optical transparence were prepared on the slide-glasses and Si substrates by the cathodic vacuum arc ion deposition.X-ray diffraction（XRD）,scanning electron microscopy（SEM） and UV-visible spectrophotometer were used to investigate the influences of deposition pressure on the crystal structure,the morphology and the properties of MgO thin films,respectively.XRD patterns indicated that MgO thin films had a NaCl-type cubic structure and the film preferred orientation changed from（100） to（110） and then to（111） with the increase of the deposition pressure.SEM images showed that the grain size of MgO decreased with increasing the deposition pressure and the crystal quality also became poorer.The transmittances of MgO thin films decreased with deposition pressure and the film deposited at 0.7Pa had a higher transmittance which was more than 90% in the visible light range of 380-900nm.