pH值对聚合物前驱体法制备WO_3薄膜光电性质的影响

Effect of pH on Photoelectrochemical Properties of Tungsten Trioxide Films Prepared by Polymetric Precursor Method

以偏钨酸铵为钨源,聚乙二醇1000为配位聚合物合成了前驱体溶胶,并用浸渍提拉法在FTO导电玻璃上制备了WO3薄膜,研究了不同pH值对WO3薄膜结构和光电性质的影响。实验结果表明,降低pH值有利于提高溶胶的稳定性;不同pH值条件下制得的薄膜均为立方晶相,且具有不同的颗粒尺寸;在500W氙灯照射下,pH=2.8时,颗粒尺寸为60nm,样品的光电流密度达到最大。

WO3 films were prepared on FTO glass by polymetric precursor method using ammonium metatung state as the precursor and polythylene glycol as the structure-directing agent. The effects of pH on microstructure and photoelectrochemical properties of WO3 films were investigated. The results indicate that lower pH value is helpful to improve the stability of collosol, the films with different particle sizes prepared at the different pH values are cubic WO3. Under 500W xenon lamp illumination, photocurrent density reaches the largest value when pH=2.8 and parti cle size for 60nm.