在铁基底上以Au/Cu为过渡层沉积金刚石膜

Deposition of diamond film on ferrous alloys substrate with Au/Cu interlayer by HFCVD

采用热丝法化学气相沉积以碳纳米管为形核剂在Ａｕ／Ｃｕ 镀膜为过渡层的铁基底上沉积金刚石膜，研究了以Ａｕ／Ｃｕ 作为过渡层的铁基底上沉积金刚石膜质量的影响因素。试验结果表明， Ａｕ／Ｃｕ 过渡层可以在铁基底上沉积出质量很好的金刚石膜，涂料、基底预处理以及沉积工艺对金刚石膜质量的改善具有明显的作用。

Diamond film on the ferrous substrate was successfully deposited with an Au/Cu intermediate layer and carbon nanotube nucleating agent by hot filament chemical vapor deposition (HFCVD). The influence of processing parameters on the qualities of the deposited diamond film was investigated. The experimental results show that nucleating agent coating, pretreatment of the substrate and the depositing processing are the important factors for controlling the quality of deposited diamond film.