载能粒子沉积薄膜生长的微观机制研究

Investigation on atomistic mechanism of film growth in energetic atom deposition

采用嵌入原子间相互作用势， 利用分子动力学方法模拟了载能原子沉积Ａｕ／Ａｕ（１００）薄膜的生长过程． 通过对薄膜生长的表面覆盖度曲线和Ｂｒａｇｇ 衍射强度等随沉积原子能量变化的研究， 发现随着沉积原子能量的增加， 薄膜的生长模式从Ｓｔｒａｎｓｋｉ－Ｋｒａｓｔａｎｏｖ 生长（Ｓ－Ｋ 生长）转变为Ｆｒａｎｋ－ｖａｎ ｄｅｒ Ｍｅｒｗ ｅ 生长（Ｆ－Ｍ 生长）． 同时， 通过对沉积原子能量、基体温度随时间的演化分析，

The energetic atom deposition of thin Au/Au(100) films was simulated by molecular dynamics method with the atom interaction potential of embedded atom method. The change of film growth from Stranski\|Kranstanov mode to Frank\|van der Merwe mode was observed with the increase of depositing atom energy from 0.1 eV to 10.0 eV. The role of energetic atom in the film growth was discussed.