多元超硬膜TiAlN的制备及其组织性能研究

Study on Manufacture and Structure and Properties of the Multi components Super Hard TiAlN Films

采用空心阴极离子镀方法，分别以Ｔｉ＋ Ａｌ％ 和ＴＣ４作为蒸发材料，在高速钢表面沉积ＴｉＡｌＮ多元超硬膜。结果表明，该镀膜工艺可行，制备出的ＴｉＡｌＮ膜层性能优异，即硬度高、膜层与基体之间结合良好。文中还对膜层的微观组织结构进行了分析。

Using Ti+Al% and TC4 as evaporating materials respectively,the TiAlN films are deposited on high speed steel (HSS) through the hollow cathode deposition (HCD).The results show that the deposition technology is feasible,and that properties of the TiAlN films are excellent,i.e. its microhardness are high and the adhesion strength between film and matrix are better.The microstructure of TiAlN films are also analyzed in this paper.