TiAlN薄膜的磁过滤脉冲真空弧等离子反应沉积制备的研究

TEXTURE AND PROPERTIES OF TIALN GRADIENT FILMS FABRICATED BY MAGNETRON FILTERED,PULSED VACUUM ARC,PLASMA REACTIVE DEPOSITION

采用磁过滤脉冲真空弧等离子反应沉积技术,在室温、钛合金和Si(100)单晶表面制备了TiAlN薄膜.利用SEM、XRD、EDS和XPS等对薄膜的微观组织结构及化学组分进行了观察测试分析,探讨了磁过滤脉冲真空弧等离子反应沉积技术的工艺参数对TiAlN薄膜结构的影响.

TiAlN gradient layer films were fabricated on titanium alloy and Si wafers, under magnetron filtered, pulsed vacuum arc, plasma reactive deposition, at ambient temperature and in a nitrogen atmosphere. The microstructure, texture and composition of deposited films were observed and analyzed using SEM, XRD, EDS and XPS.