摘要
在Si基底上采用直流磁控溅射法制备CrN薄膜,利用原子力显微镜(AFM)、扫描电镜(SEM)和X射线衍射仪(XRD)分析薄膜表面形貌和物相成分,探讨薄膜生长的动力学过程。结果表明:只有当生长时间足够(1 800 s)时,才能形成具有CrN相的薄膜。随着CrN薄膜的生长,薄膜表面晶粒由三棱锥发展为三棱锥与胞状共存状,薄膜表面粗糙度逐渐增大,动力学生长指数β=0.50。
The CrN films were deposited on silicon substrate by direct current(DC) magnetron sputtering.The atomic force microscope(AFM),scanning electron microscope(SEM) and X-ray diffractometer(XRD) were used to analyze film surface morphology and phase structure.The dynamics of film growth processes was investigated.The results show that CrN films are formed only when the deposition time is enough(1 800 s).With the growth of films the surface grains change from pyramidal structure to the coexistence of pyramidal and cellular structure,and the film surface roughness increases gradually.The growth exponent is β=0.50.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
2011年第6期1367-1372,共6页
The Chinese Journal of Nonferrous Metals
基金
国家科技支撑计划资助项目(2007BAE15B05)
关键词
直流磁控溅射
表面形貌
粗糙度
生长指数
direct current magnetron sputtering
surface morphology
roughness
growth exponent