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垂直Bridgman法生长Cd_(1-x)Mn_xTe晶体的缺陷研究 被引量:3

Study on Defects in Cd_(1-x)Mn_xTe Crystals Grown by Vertical Bridgman Method
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摘要 本文采用垂直布里奇曼(Bridgman)法生长了尺寸为30 mm×130 mm的Cd1-xMnxTe晶体,利用Nakagawa腐蚀液显示了晶体的位错、Te夹杂相和孪晶缺陷,并采用傅立叶变换红外光谱仪研究了晶体的红外透过率与晶体缺陷之间的关系。结果表明:生长态Cd1-xMnxTe晶体的位错密度为104~105cm-2,Te夹杂相密度为103~104cm-2,晶体中的孪晶主要为共格孪晶,孪晶面为{111}面,且平行于晶体生长方向。在入射光波数4000~500 cm-1范围,晶体的红外透过率为36.7%~55.3%,红外透过率越大,表明晶体的位错和Te夹杂相密度越低,晶体对该波长范围的红外光表现为晶格吸收和自由载流子吸收。 Cd1-xMnxTe single crystal with the dimensions of 30 mm×130 mm were grown by vertical Bridgman method.The structural defects of dislocations,Te inclusions and twins in the as-grown crystal were effectively revealed by the Nakagawa etchant,and the relation between IR transmitance and defect was investigated by the Fourier-transform infrared(FT-IR) spectra.The results indicated that the etch pits density in the crystal was of 104-105 cm-2 and the Te inclusion density of 103-104 cm-2.The twins observed in the as-grown ingot were mainly coherent ones,which lay on the {111} face and ran parallel to the growth axis of the ingot.The IR transmittance of the as-grown wafers under the incident IR wavenumber range of 4000-500 cm-1 was in the range of 36.7%-55.3%.Crystals with higher IR transmittance reflect lower dislocation density and lower Te inclusion density.It is found that the lattice absorption and free carrier absorption to the IR from 4000-500 cm-1 are the main absorption mechanics involved in the FT-IR spectra in Cd1-xMnxTe crystals.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2011年第3期543-547,551,共6页 Journal of Synthetic Crystals
基金 国家自然科学基金(No.50902091) 上海市博士后科研资助计划(09R21413000)
关键词 Cd1-xMnxTe 位错 Te夹杂相 孪晶 红外透过率 Cd1-xMnxTe dislocation Te inclusion twin IR transmittance
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  • 1Galazka R R, Nagata S, Keesom P H. Paramagnetic-spin-glass-antiferromagnetic PhaseTransitions in CdI _~ Mn~Te from Specific Heat and Magnetic Susceptibility Measurements [ J ]. Physical Rev/ew B, 1980,22 : 3344-3355.
  • 2Peterson D L, Petrou A, Datta M, et al. Spin-flip Raman Scattering in a Diluted Magnetic Semiconductor: CdI _, Mn, Te [ J ]. Solid State Communication, 1982,43:667-669.
  • 3Furdyna J K. Diluted magnetic semiconductors[J]. Journal of Applied Physics,1988,64(4) :R29-R64.
  • 4刘宜华,张连生.稀释磁性半导体[J].物理学进展,1994,14(1):82-120. 被引量:18
  • 5Mycielski A, Kowalczyk L, Galazka R R, et al. Application of II-VI Semimagnetic Semiconductors [ J ]. Journal of Alloys and Compound,2006, 423 : 163-168.
  • 6Hossain A, Cui Y, Bolotnikov A E, et al. Vanadium-doped Cadmium Manganese Telluride (CdMnTe) crystals as X- and Gamma-ray detectors [ J ]. Journal of Electronic Materials,2009,38 : 1593-1599.
  • 7Burger A, Chattopadhyay K, Chen H, et al. Crystal Growth, Fabrication and Evaluation of Cadmium Manganese Telluride Gamma ray Detectors [ J]. Journal of Crystal Growth, 1999,198/199:872-876.
  • 8Donald A R, Smart H, James C, et at. Third Generation Imaging sensor System Concepts[ J]. SPIE, 1999,3701:108-117.
  • 9于晖,介万奇,查钢强,杜园园,王涛,徐亚东.CdZnTe平面核辐射探测器研究[J].人工晶体学报,2009,38(3):620-624. 被引量:10
  • 10Zhang J J, Jie W Q, Wang T, et al. Vertical Bridgman Growth and Characterization of CdMnTe Substrates for HgCdTe Epitaxy[ J]../ourna/of Crysta/Growth,2008, 310 : 3203-3207 ( in Chinese).

二级参考文献26

  • 1Furdyna J K. Diluted Magnetic Semiconductor[J]. J. Appl. Phys,1988,64(4) :R29.
  • 2Bridenbaugh P M. Distribution Coefficient of Mn in Cd1-xMnxTe Single Crystals [ J ]. Materials Letters, 1985,3:287-289.
  • 3Mycielski A, Burger A, Sowinska M, et al. Is the (Cd, Mn)Te Crystal a Prospective Material for X-ray and r-ray Detector? [ J ]. Phys. Stat. Sol (c) ,2005,2(5) :1578-1585.
  • 4Triboulet R, Didier G. Growth and Characterization of Cd1-xMnxTe and MnTe Crystals; Contribution to the CdTe-MnTe Pseudo-binary Phase Diagram Determination [ J ]. J. Crystal Growth, 1981,52:614-618.
  • 5Trivedi S B, Kutcher S W, Wang C C, et al. Transition Metal Doped Cadmium Manganese Telluride:a New Material for Tunable Mid-infrared Lasing[ J ]. J. Electronic Material ,2001,30 (6) :728-732.
  • 6Zhang J J, Jie W Q, Wang T, et al. Crystal Growth and Charateration of Cd0. 8 Mn0. 2 Te using Vitical Bridgman Method [ J ]. Materials Research Bulletin ,2008,43 ( 5 ) : 1239-1245.
  • 7Kroger F A. The Chemistry of Imperfect Crystal[J]. Journal of Nuclear Materials ,1964,13(2) :288.
  • 8Berding M A, Schilfgaarde M V, Sher A. First-principles Calculation of Native Defect Densities in Hg0.8Cd0.2Te[J]. Phys. Rev. B,1994,50:1519.
  • 9Grill R, Zappettini A. Point Defects and Diffusion in Cadmium Telluride[ J ]. Progress in Crystal Growth and Characterization of Materials ,2004,48/ 49 : 209 -244.
  • 10Brebrick R F. Equilibrium Constants for Quasi-chemical Defect Reactions[ J]. J. Electron Mater,2004,33( 11 ) :L24.

共引文献28

同被引文献23

  • 1王英伟,刘景和,程灏波,李建利.勾形磁场中直拉硅单晶浓度场的数值模拟研究[J].硅酸盐学报,2005,33(2):133-139. 被引量:6
  • 2YUE J T,VOLTMER F W.Influence of gravity-free solidification on solute microsegregation [J].J Crys Growth,1975,29: 329–341.
  • 3WITT A F,GATOS H C,LICHTENSTEIGER M,et al.Crystal growth and steady-state segregation under zero gravity: InSb [J].J Electrochem Soc,1975,122: 276–283.
  • 4KESTIGIAN M,BOLLONG A B,DERBY J J,et al.Cadmium zinc telluride substrate growth,characterization and evaluation [J].J Electron Mater,1999,28: 726–731.
  • 5REGEL L L,WILCOX W R.A review of detached solidification in microgravity [J].Microgravity Sci Technol,1999,14: 152–166.
  • 6DUFFAR T,PARET-HARTER I,DUSSERRE P.Crucible de-wetting during Bridgman growth of semiconductors in microgravity [J].J Cryst Growth,1990,100: 171–184.
  • 7LARSON.Orbital processing of high-quality cadmium zinc telluride CdZnTe compound semiconductors [J].Microgravity News,1994,10: 1–6.
  • 8SYLLA L,DUFFAR T.Numerical simulation of temperature and pressure fields in CdTe growth experiment in the Material Science Laboratory (MSl) onboard the International Space Station in relation to dewetting [J].J Cryst Growth,2007,303: 187–192.
  • 9GALINDO V,GERBETH G,TOMZIG E,et al.Crystal growth melt flow control by means of magnetic fields [J].Energy Convers Manage,2002,43: 309–316.
  • 10TATYANA P,LYUBIMOVA,ARNE C,et al.Time-dependent magnetic field influence on GaAs crystal growth by vertical Bridgman method [J].J Cryst Growth,2004,266: 404–410.

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