248nm光刻胶单体对羟基苯乙烯及其衍生物的合成工艺研究

Study on the synthetic process of monomers of p-hydroxystyrene and its derivatives for 248nm photoresist

以对羟基苯甲醛(PHB)为起始原料,首先合成中间体对羟基肉桂酸(PHCA),然后再通过脱羧反应,制备对羟基苯乙烯(PHS),最后再由PHS出发,分别合成对乙酰氧基苯乙烯(PAS)和对特丁氧酰氧基苯乙烯(PTBOCS)。主要考察了反应溶剂及分离提纯方法对产品制备工艺的影响。研究结果表明:以4-甲基吡啶代替吡啶作为反应溶剂制备中间体PHCA,采用成盐法纯化PHS、萃取法精制PAS和PTBOCS,所得目标产物PHS产率为93%、PAS产率为88%、PT-BOCS产率为85%,产品纯度均大于98%。

P-hydroxystyrene was prepared by decarboxylation of the intermediates p-hydroxycinnamic acid synthesized from p-Hydroxybenzaldehyde as original reactant.The derivatives p-acetoxystyrene and p-tert-butoxycarbonyloxystyrene were finally obtained by using protective groups.The solvent and separating-purification method were mainly investigated.The results showed that preparing p-hydroxycinnamic acid by using 4-methylpyridine instead of pyridine,purifying p-hydroxystyrene by salt forming method and refining p-acetoxystyrene and p-tert-butoxycarbonyloxystyrene by extraction method were all well-tried.The yields of p-hydroxystyrene and p-acetoxystyrene and p-tert-butoxycarbonyloxystyrene were 93%,88% and 85%,respectively,while the purity of aim products were higher than 98%.