摘要
将硅片用"Piranha"溶液浸蚀处理,使其表面富含羟基,然后用3-氨基丙基-三乙氧基硅烷(APTES)进行表面修饰,得到硅片表面APTES单分子层,利用APTES分子上的氨基与Ce^(4+)组成复合引发聚合体系,引发N-异丙基丙烯酰胺(NIPAm)单体进行硅表面接枝聚合。采用表面接触角测定(CA)、X-射线光电子能谱分析(XPS)和原子力显微镜(AFM)分析对产物进行表征,结果表明约50nm厚度的聚N-异丙基丙烯酰胺薄膜能成功地接枝到硅片表面。
The silicon substrate was hydroxylated by ＂piranha＂ solution and then was modified with 3-aminopropyltriethoxysilane （APTES） monolayer, followed by the surface initiated graft radical polymerization of N-isopro- pylacrylamide （NIPAm） via amino groups of APTES monolayer chemical bonded with silicon substrate surface and adscititious Ce^4＋ as a redox initiating system to obtain the PNIPAm fil~ The microstructure of PNIPAm film was e xamined by water contact angle （CA）, X-ray photoelectron spectroscopy （XPS）, spectroscopic ellipsoeter, and atomic force microscopy （AFM）, respectively. And the results showed that about 50 nm thickness of PNIPAm film successfully formed on the silicon substrate.
关键词
硅片
聚N-异丙基丙烯酰胺
表面引发聚合
silicon substrate, poly（N-isopropylacrylamide）, Surface initiated polymerization
