摘要
采用集成电路工艺模拟软件ＳＳＵＰＲＥＭ４ 模拟了氧化、扩散工艺， 并同实验值进行了比较，模拟值和实验值的偏差在１０％ 以内。与集成电路器件模拟软件Ｓ－ＰＩＳＣＥＳ联用模拟了ＳＳＵＰＲＥＭ４ 的全工序， 并把它应用于实际生产。结果表明ＳＳＵＰＲＥＭ ４
This paper presents an extensive application of the well known IC process simulator SSUPREM4.The oxidation and diffusion process are simulated by SSUPREM4 and compared with experimental results.The relative deviation between simulated values and experimental values are within 10%.The full process is simulated by SSUPREM4 together with the device simulator S PISCES.It has been applied to practical production.The results show that SSUPRE4 has much value of application.
出处
《半导体技术》
CAS
CSCD
北大核心
1999年第6期29-32,51,共5页
Semiconductor Technology
