摘要
论述了造成微波输出窗损坏的各种因素,指出了次级电子的倍增效应是输出窗损坏的主要原因。在抑制次级电子发射的工艺措施中,详细介绍了氮化钛薄膜的性能、以及磁控溅射敷膜工艺的特点。
This paper discuss various factors which cause the damage of microwave output window and indicate that secondary electron＇s multiplication is the main reason.In the technical measures which suppress the emission of the secondary electron,the performance of titanium nitride films and the process characteristics of magnetron sputtering are described in detail.
出处
《真空电子技术》
2011年第3期59-61,共3页
Vacuum Electronics
关键词
次级电子
倍增效应
介质损耗
Secondary electron emission
Multiplier effect
Dielectric loss
