基于遗传算法的真空磁控溅射射频阻抗匹配仿真研究

Simulation of RF Impedance Matching of Magnetron Sputtering Based on Genetic Algorithm

针对真空磁控溅射射频电源阻抗匹配问题,设计射频L型阻抗匹配网络结构。在负载阻抗不同速率变化时,基于遗传算法优化反射系数指标,通过调节匹配网络中两个电容值以达到与射频源的阻抗匹配。大量仿真结果表明,遗传算法的阻抗匹配过程,反射系数能够很快地被调节到最佳值;即使负载阻抗产生较大突变,匹配网络亦能使反射系数快速恢复到最佳匹配点。匹配过程速度快、在最佳匹配点处反射系数波动小、匹配系统精度高。

The impedance matching of the radio-frequency（RF） power supply used in magnetron sputtering equipment was simulated based on genetic algorithm.A dedicated Ltype RF impedance matching network,the two capacitors of which,C1 and C2,can be automatically regulated to match the impedances of the power supply and the load,was designed,constructed and installed in the control unit of the magnetron sputtering equipment.The simulated results show that when the load impedance changes at different rates,especially at an abrupt,large rate,the reflection coefficient can be rapidly optimized.The test results confirmed that the newly-developed impedance matching network is capable of rapidly reducing the fluctuation below 0.05 and providing a high precision regulation.