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SiGe体单晶的研究进展 被引量:6

Research Development of SiGe Bulk Single Crystal
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摘要 综述了近年来SiGe体单晶在材料特性、生长方法及应用方面的研究进展, The recent research development of SiGe bulk single crystal in material pro perties,growth methods and application is reviewed in this paper,and the prospect of this material is forecasted.
作者 苏宇欢
机构地区 电子四十六所
出处 《半导体情报》 1999年第6期27-30,共4页 Semiconductor Information
关键词 体单晶 生长 锗化硅 半导体材料 SiGe Bulk single crystal Growth methods Application
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同被引文献47

  • 1蒋中伟,张维连,陈洪建,孙军生.SiGe合金材料热电转换效应的应用和研究进展[J].河北工业大学学报,2004,33(4):31-35. 被引量:3
  • 2闻莺,袁汉章,朱腾,刘亚雯.半导体硅材料中掺杂元素锗的SRXRF微区分析研究[J].分析试验室,1994,13(3):77-79. 被引量:7
  • 3高敏,D.M.Rowe.SiGe/GAP合金的高温退火特性[J].Journal of Semiconductors,1990,11(9):713-717. 被引量:2
  • 4姜洪义,王华文,任卫.SiGe热电材料的发展与展望[J].材料导报,2007,21(7):119-121. 被引量:12
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  • 7Kazuo Nakajima. Toshihiro Kusunoki Compositional variation in Si-rich SiGe single crystals grown by multi-component zone melting method using Si seed and source crystal [J]. Journal of Crystal Growth, 2002, 240: 373-381.
  • 8Richard H, Ditch Bulk. Single Crystal Growth of Silicon-Germanium [J]. Journal of Electronic Materials, 2000, 29 (9) : 1 074-1 078.
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