8～14μm波段低红外发射率与低光泽度兼容涂层的制备方法初探

Preparation methods of low infrared emissivity and low glossiness coatings for 8-14 μm wave band

采用添加消光剂、添加色浆、球磨混合金属粉填料3种方法对低发射率涂层进行消光处理。结果表明:当添加普通消光剂如气相SiO2、纳米TiO2时,涂层的光泽度明显降低,但发射率明显升高;清漆中加入色浆后光泽度降低,但当Al粉添加量大于等于20%,涂层光泽度显著升高且涂层表面基本只显示出闪亮铝色;选择青铜粉部分取代铝粉作为填料混合球磨可以制备出光泽度和发射率都比较低的兼容涂层;球磨混合金属粉时球磨时间要恰当,球磨时间太短不利于涂层光泽度的降低,太长影响涂层发射率。

Three methods for extinction processing of low emissivity coating were used, which include adding wave-ray agents, adding paste, ball milling mixed metal powder. The results show that when adding ordinary platting agents, such as gas phase SiO2 and nanometer TiO2, the glossiness of coating obviously decreases, but infrared emissivity significantly increases; the glossiness of varnish obviously decreases after adding color pastes, but when the adding amount of Al powder is greater than or equal to 20%, the glossiness of the coating increases significantly and the surface of the coating basicly shows only aluminum color; partial substitution of aluminum powder by bronze powder and ball milling can prepare compatible coatings with low glossiness and emissivity; the milling time should be adequate, too short is adverse to the reduction of glossiness, too long is not good for the emissivity.