摘要
本文用蒙特卡罗的方法,针对基片温度、吸附粒子的迁移运动、基片与源之间的距离等因素,在计算机上对薄膜生长进行仿真模拟,同时研究了各种因素对粒子沉积成膜的影响,并对膜层的微观结构特性进行了分析和讨论。
According to the temperature of base、movement of adsorbed particles and the distance between the surface and the source, Monte carlo method is applied to simulate the growth of film though the computer, and also studied the influence on film by each factor. Finally, this paper analyzed and discussed the micro structure of the film.
出处
《电子器件》
EI
CAS
1999年第4期313-316,共4页
Chinese Journal of Electron Devices