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随机掺杂波动引起的6T SRAM访问失效率分析

Analysis of Access-Time Failure Probability Due to Random Dopant Fluctuation in 6T SRAM
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摘要 对6T SRAM的访问时间进行解析,得到在随机掺杂波动影响下6T SRAM访问时间的模型,结果与HSPICE仿真结果相符。通过分析偏置技术与访问失效率的密切关系,提出采用偏置技术降低存储单元访问失效率的方法。 In nano-scaled CMOS circuits,random dopant fluctuations would cause significant variations in threshold voltage(Vth) of transistors,which have great effects on both device and logic circuits.An analytical access-time model for 6T SRAM was developed based on RDF,and the analytical results agreed with HSPICE simulation.By analyzing the relation of access-time failure probability with bias control technology,a bias control technology was proposed to reduce access-time failure probability.
出处 《微电子学》 CAS CSCD 北大核心 2011年第4期599-602,616,共5页 Microelectronics
基金 国家建设高水平大学公派研究生基金资助项目
关键词 随机掺杂波动 SRAM 访问失效率 偏置控制技术 Random dopant fluctuation SRAM Access failure probability Bias control technology
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参考文献11

  • 1LI Y M, HWANG C H, LI T Y, et al. Process- variation effect, metal-gate work-function fluctuation, and random dopant fluctuation in emerging CMOS technologies [J]. IEEE Trans Elec Dev, 2010, 57 (2) : 437-447.
  • 2ZHAI B, HANSON S, BLAAUW D, et al. A variation-tolerant sub-200 mV 6-T subthreshold SRAM [J]. IEEE J Sol Sta Cire, 2008, 43 (10): 2338-2348.
  • 3HWANG C H, LIT Y, HAN M H, et al. Statistical analysis of metal gate workfunction variability, process variation, and random dopant fluctuation in nano-CMOS circuits [C] // Int Conf Simu Semicond Process Device. San Diego, CA, USA. 2009: 1-4.
  • 4CHUANG C T, MUKHOPADHYAY S, KIM J J, et al. High-performance SRAM in nanoscale CMOS: design challenges and techniques [C]// IEEE Int Works Memory Technology, Design, Test. Taipei, Taiwan, China. 2007: 4-12.
  • 5CHEN J H, CLARK L T, CAO Y. Ultra-low voltage circuit design in the presence of variations [J]. IEEE Circ Dev Mag, 2005, 21(6) : 1-9.
  • 6DREGO N, CHANDRAKASAN A, BONING D. Lack of spatial correlation in MOSFET threshold voltage variation and implications for voltage scaling [J]. IEEE Trans Semicond Manufac, 2009, 22(2): 245-255.
  • 7KIM T H, LIU J, KIM C H. An 8T subthreshold SRAM cell utilizing reverse short channel effect for write margin and read performance improvement [C]// Cust Integr Circ Conf. San Jose, CA, USA. 2007 : 241-244.
  • 8NgZUN) T, (2NUMI"URA J, TORIUMI A. Expetal study of threshold voltage fluctuation due to statistical variation of channel dopant ntma~r in NKBFE'T's[J]. IEEE Tran~s Elec Dev, 1994, 41(11): 2216-2221.
  • 9PAt~ULIS A. Probability, random variables and stochastic process [M]. New York: McCraw-Hill, 1991.
  • 10RABAEY J M, CHANDRAKASAN A. Digital integrated circuits: a design perspective [M]. 2^nd Ed. Upper Saddle River, New Jersey: Prentice Hall, 2003.

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