金刚石膜在偏压电场作用下的成核行为

Nucleation Behavior of Diamond Films under the Effect of Bias Field

探讨了用微波等离子体化学气相沉积法(MPCVD)在Si(100)衬底上加偏压电场和不加偏压电场情况下金刚石膜的成核行为.并经用原子力显微镜(AFM)分析,偏压电场对金刚石成核有促进作用.文章也分析了偏压电场所以能促进金刚石成核的机制.

The nucleation behaviour of diamond films on Si(100) substrates is investigated with and without bias field by MPCVD. By the analysis of AFM, bias field can contribute to the diamond nucleation. The mechanism of contribution of bias field to the diamond nucleation has also been analysed.