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Preparation of Sn-Ag-In ternary solder bumps by electroplating in sequence and reliability

Preparation of Sn-Ag-In ternary solder bumps by electroplating in sequence and reliability
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摘要 This paper describes a technique that can obtain ternary Sn-Ag-In solder bumps with fine pitch and homogenous composition distribution.The main feature of this process is that tin-silver and indium are electroplated on copper under bump metallization(UBM) in sequence.After an accurate reflow process,Sn_(1.8)Ag_(9.4)In solder bumps are obtained.It is found that the intermetallic compounds(IMCs) between Sn-Ag-In solder and Cu grow with the reflow time,which results in an increase in Ag concentration in the solder area.So during solidification, more Ag_2In nucleates and strengthens the solder. This paper describes a technique that can obtain ternary Sn-Ag-In solder bumps with fine pitch and homogenous composition distribution.The main feature of this process is that tin-silver and indium are electroplated on copper under bump metallization(UBM) in sequence.After an accurate reflow process,Sn_(1.8)Ag_(9.4)In solder bumps are obtained.It is found that the intermetallic compounds(IMCs) between Sn-Ag-In solder and Cu grow with the reflow time,which results in an increase in Ag concentration in the solder area.So during solidification, more Ag_2In nucleates and strengthens the solder.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第8期27-32,共6页 半导体学报(英文版)
关键词 Sn-Ag-In solder bumps ELECTROPLATING MICROSTRUCTURE shear strength Sn-Ag-In solder bumps electroplating microstructure shear strength
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