硅酸盐玻璃的化学处理研究进展

Research Progress in Wet Chemical Etching of Silicate Glass

氢氟酸溶液常用于硅酸盐玻璃的表面处理,其化学反应机理一直备受关注。本文从氢氟酸电离反应出发,全面归纳氢氟酸稀溶液电离机理、平衡常数以及各电离产物的作用,重点总结了HF-SiO2反应动力学、各研究理论模型、反应速率公式和反应机理。针对目前硅酸盐玻璃的化学处理研究现状,认为硅酸盐玻璃在高浓度氢氟酸溶液和氢氟酸/强酸混合溶液中化学处理的应用将是未来的研究方向。

The reaction mechanism of wet chemical etching of silicate glass in hydrofluoric acid has attracted extensive attention over many years. Ionization reaction in dilute HF solution was introduced. The ionization equation and equilibrium constants and the function of components in dilute HF solution were reviewed. And the reaction kinetics, model, reaction rate formula and etching mechanism of HF- SiO2 reaction were summarized. In the future the application of wet chemical etching in concentrated HF solution and HF-strong acid mixture of wet chemical etching of silicate glass would be studied.