摘要
介绍了镀膜技术和红外热像仪测量镀膜材料发射率的方法,并利用红外热像法分析了基底材料对薄膜发射率的影响。通过实验研究了镀膜时间与膜厚度变化导致的测量波段发射率的变化关系。
The method of measuring the emissivity of the coating material with thermal infrared imager as well as coating technology was introduced;the influence of backing material on emissivity of thin film was analyzed.By experiment,the change of measured wavelength induced by coating time and the thickness of thin film was studied.
出处
《大学物理实验》
2011年第4期22-25,共4页
Physical Experiment of College
基金
浙江大学2011年度本科教学方法改革研究立项课题(sy-1)
关键词
发射率
基底材料
镀膜仪
红外热像仪
emissivity
backing material
auto sputter coater
infrared thermal imaging
