三价铬电镀技术研究进展

Progress in Research on Trivalent Chromium Plating Technology

回顾了三价铬电镀的发展历程,介绍了硫酸盐体系三价铬电镀装饰铬的新工艺。新工艺镀铬速度增加到0.057～0.077μm/min,并且速度不随时间而变化。镀液性能稳定,操作简单,便于维护。镀层质量优良,色泽美观,厚度能够达到0.3μm以上。中性盐雾试验、恒定湿热试验、冷热冲击试验、人造汗液测试、抗化学污染测试均能满足行业标准的要求。新工艺性能优越,能够更好地满足广大客户的要求。

Development course of trivalent chromium plating was reviewed and new technology of sulphate trivalent chromium plating was introduced.Using the new technology,chromium plating rates increase to from 0.055 to 0.075μ m/min,and the rates do not vary with electroplating time,which achieve a new breakthrough.The chromium plating solution is stable,operation simple,and control easy.The chromium coating quality is excellent,color beautiful and thickness can exceeds 0.3 μm.Salt spray testing（NNS）,basic environmental testing（damp heat,steady state）,synthetic sweat testing,and chemical pollution resistance testing all meet the needs of the standards.Researches showed that the new technology of trivalent chromium plating has obvious superiority to others and can satisfy requirement of more buyer.