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退火处理对W:Bi_4Ge_3O_(12)和Bi_(12)GeO_(20)晶体发光性能的影响

Effects of Annealing Treatment on the Photoluminescence Properties of W:Bi_4Ge_3O_(12) and Bi_(12)GeO_(20) Crystals
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摘要 通过提拉法制备了W∶Bi4Ge3O12和Bi12GeO20晶体,测试了晶体的吸收光谱、光致发光谱和发光衰减时间等。W∶Bi4Ge3O12的可见光发光强度比纯Bi4Ge3O12有所增强,而且N2中退火处理对W∶Bi4Ge3O12发光有进一步增强作用。Bi12GeO20在N2中退火处理后在745 nm附近有发光峰,其衰减时间为10μs左右。两种晶体退火处理后发光均增强,认为是低价Bi离子发光所致。 W∶Bi4Ge3O12 and Bi12GeO20 crystals were prepared by Czochralski(Cz) method.The absorption,photoluminescence(PL) and PL lifetime spectra were investigated.The results revealed the PL intensity of W∶Bi4Ge3O12 was stronger than that of Bi12GeO20,and annealing in N2 can increase the PL intensity of W∶Bi4Ge3O12.Near infrared PL(at about 745 nm) was observed in Bi12GeO20 annealed in N2,and the lifetime was about 10 μs.The mechanisms of luminescence in W∶Bi4Ge3O12 and annealed Bi12GeO20 was discussed.
出处 《发光学报》 EI CAS CSCD 北大核心 2011年第8期825-829,共5页 Chinese Journal of Luminescence
基金 国家自然科学基金(60778036 60938001)资助项目
关键词 W∶Bi4Ge3O12 Bi12GeO20 光致发光 退火 W∶Bi4Ge3O12 Bi12GeO20 photoluminescence anneal
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  • 1Flood F A 2000 Proceedings of Optical Fiber Communications Conference Baltimore, 5-10 March 2000, WG1-2.
  • 2Federighi M, Pasquale F D 1995 IEEE Photon. Technol. Lett. 7 303.
  • 3Mori A, Ohishi Y, Sudo S 1997 Electron. Lett. 33 863.
  • 4YangJ H, Dai S X, Zhou Y F, Wen L, Hu L L, Jiang Z H 2003 J. Appl. Phys. 93 977.
  • 5Yamada M, Ono H, Ohishi Y 1998 Electron. Lett. 34 1490.
  • 6Fujimoto Y,Nakatsuka M 2001 Appl. Phys. Lett. 40 L279.
  • 7Fujimoto Y, Nakatsuka M 2003 Appl. Phys. Lett. 82 3325.
  • 8Okhrimchuk A G, Butvina L N, Dianov E M, Lichkova N V, Zagorodnev V N, Boldvrev K N 2008 Opt. Lett. 33 2182.
  • 9Ruan J, Su L B, Qiu J R, Chen D P, Xu J 2009 Opt. Exp. 17 5163.
  • 10Peng M Y, Qiu J R, Chert D P, Meng X G, Yang I Y, Jiang X W, Zhu C S 2008 Opt. Lett. 29 1998.

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