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双光子技术在光生酸剂中的应用研究

Two-Photon Activable Photoacid Generators and Their Applications
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摘要 自2000年以来,双光子技术开始应用于光生酸剂体系中,并取得了一定的研究进展。双光子技术在光生酸剂中的应用主要有两种情况:一是单分子体系,即光生酸剂分子本身具有较高的双光子吸收截面,可以在双光子激发下产生光酸;二是双分子体系,由具有较高吸收截面的敏化剂分子和光生酸剂分子组成,通过分子间电子转移的方式产生光酸。本文就这一类具有特殊光学性质的有机分子体系的构成及其应用进行了综述,介绍了不同类型的可以利用双光子技术的光生酸剂体系,总结了双光子技术在光生酸剂发展中面临的一些关键问题,展望了双光子技术在光生酸剂中的发展方向。 Since 2000,the two-photon activable photoacid generators(PAGs) have attracted much attention and made some progress.There are two different ways for the application of two-photon in PAGs system.First is single molecular system,that is a PAG molecule which can decompose and generate strong acid under irradiation of laser by two-photon mode.Second one is a bi-molecular systems consisted of a photoacid generators and a sensitizer with high two-photon absorption cross section.The latter can transfer electron to PAG by intermolecular charge transfer.Both systems can efficiently initiate photopolymerization reactions by radical or cationic routes.In addition,the photoproduced protons can be used in 3D photolithography,3D microfabrication.And finally,fine structures were prepared that can not accessible by traditional linear one-photon mode.In this paper,the molecular structures of reported two-photon activable PAGs systems and their applications in two-photon 3D microfabrications are reviewed.It explores the photoacid generating mechnisms of different kinds of PAGs systems that can excitated by two-photon mode,and summarizes the present problems,that are mainly on the competitions between two-photon absorption cross sections and high quantum yield of photoacid generation,especially in single molecular systems.In the end,the future research direction in the development of two-photon activable PAGs systems are prospected.
出处 《化学进展》 SCIE CAS CSCD 北大核心 2011年第9期1854-1861,共8页 Progress in Chemistry
基金 国家自然科学基金项目(No.20902069)资助
关键词 双光子吸收 光生酸剂 双光子光刻 微构筑 two-photon absorption photoacid generators(PAGs) two-photon lithography microfabrication
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参考文献50

  • 1Ito H, Willson C G (Eds). Polymers in Electronics, ACS Symp. Ser., 1984.
  • 2Ito H. Jpn. J. Appl. Phys., 1992, 31:4273-4282.
  • 3王美丽(WangML) 王文广(WangWG) 韩元利(HanYL) 蒲嘉陵(PuJL).北京印刷学院学报,2008,.
  • 4王美丽(WangML) 王文广(WangWG) 韩元利(HanYL) 蒲嘉陵(PuJL).影像科学与光化学,2008,.
  • 5He G S, Tan L S, Zheng Q D, Prasad P N. Chem. Rev., 2008, 108:1245-1330.
  • 6Ziemelis K. Nature, 2000, 406:1021-1021.
  • 7马文波(MaWB) 吴谊群(WuYQ) 顾冬红(GuDH) 干福熹(GanFX).化学进展,2004,.
  • 8Denk W, Strickler J H, Webb W W. Science, 1990, 248:73-76.
  • 9Kohler R H, Cao H J, Zipfel W R, Webb W W. Science, 1997, 276:2039-2042.
  • 10Larson D R, Zipfle W R, Williams R M, Clark S W, Bruehez M P, Wise F W, Webb W W. Science, 2003, 300:1434-1436.

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