摘要
CVD金刚石膜作为光学透射窗口和新一代计算机芯片的材料,其表面必须得到高质量抛光,但是现存方法难以满足既高效又超精密的加工要求.本文提出机械抛光与化学机械抛光相结合的方法.首先,采用固结金刚石磨料抛光盘和游离金刚石磨料两种机械抛光方法对CVD金刚石膜进行粗加工,然后采用化学机械抛光的方法对CVD金刚石膜进行精加工.结果表明,采用游离磨料抛光时材料去除率远比固结磨料高,表面粗糙度最低达到42.2 nm.化学机械抛光方法在CVD金刚石膜的超精密抛光中表现出较大的优势,CVD金刚石膜的表面粗糙度为4.551 nm.
CVD diamond film, as the material for optical transmission windows and new-generation computer chips, is required to be fine polished. However, there is so far no individual method which can polish CVD diamond film with both high efficiency and fine polishing quality. This paper attempted to polish CVD diamond film by combining chemical mechanical polishing （CMP） method and mechanical polishing method. CVD diamond film was first polished by fixed abrasive and free diamond abrasive to remove course asperities, and subsequently polished by CMP to achieve fine surface. According to the experimental results, the material removal rate achieved by free diamond abrasive is much higher than that by fixed abrasive. The surface roughness of CVD diamond film polished by free diamond abrasive is about 42. 2 nm. Fine surface quality of CVD diamond film was achieved by CMP and the surface roughness is about 4. 551 nm.
出处
《纳米技术与精密工程》
EI
CAS
CSCD
2011年第5期451-458,共8页
Nanotechnology and Precision Engineering
基金
国家重点基础研究发展计划(973计划)资助项目(2011CB706704)
国家自然科学基金资助项目(50575034).
关键词
CVD金刚石膜
化学机械抛光
固结磨料
机械抛光
CVD diamond film
chemical mechanical polishing
fixed abrasives
mechanical polishing
