ZnO薄膜气相法制备

Preparation of ZnO Thin Films by Thermal Vapor Condensation

ZnO薄膜具有压电、光电、压敏、气敏、发光等多种特性,应用十分广泛。介绍了ZnO薄膜气相法制备原理中的各类主要方法,包括脉冲激光沉积、磁控溅射、分子束外延、金属有机化合物化学气相沉积、单源化学气相沉积和等离子体增强化学气相沉积等技术;分析了这些方法的优缺点;展望了ZnO薄膜今后的研究方向。

ZnO thin films have many characteristics such as piezoelectricity, photoelectricity voltage-sensitive, gas-sensitive, luminescence, etc. Therefore, it can he used in various fields. This article introduces some important methods of ZnO thin films which were prepared by thermal vapor condensation, such as pulsed laser deposition, magnetron sputtering, molecular beam epitaxy, metal-organic chemical vapor deposition, single-source chemical vapor deposition and plasma enhanced chemical vapor deposition, etc. The advantages and disadvantages of these methods are analyzed. Finally, the research direction of ZnO thin films in the future is prospected.