摘要
介绍了对覆锇扩散阴极锇膜与钨基间互扩散过程的研究结果。通过SEM对不同工作时间的阴极发射表面及纵向剖面的形貌进行分析,采用EDS对实验阴极的表面及纵向剖面进行元素成分的分析。研究表明,随工作时间的不同,阴极表面及纵向剖面Os-W浓度发生变化,呈现明显的扩散趋势。
The inter diffusion between Os film and W matrix is studied in this paper.The emission surface and longitudinal section are analyzed by scanning electron microscope and element analysis of cathode sample surface is investigated by energy dispersion X-ray spectroscopy.The investigation reveals that the concentration of Os-W in the emission surface and longitudinal section has changed and inter diffused obviously.
出处
《真空电子技术》
2011年第4期72-74,84,共4页
Vacuum Electronics
关键词
阴极
Os膜
互扩散
Cathode
Os film
Diffusion
