摘要
采用射频磁控溅射方法在硅(100)衬底上制备了不同含量元素钕(Nd)掺杂的氧化锌薄膜.XRD分析表明,所有ZnO薄膜都具有c轴择优取向.随着Nd掺杂量的增加,(002)衍射峰的强度减弱,颗粒的尺寸变小.紫外-可见光谱分析表明,所有薄膜在可见光区的透过率超过85%,随着Nd掺杂量的增加,光学带隙从3.30 eV增加到3.40 eV.用XPS对薄膜的表面化学态进行表征,Nd元素在ZnO薄膜表面以Nd3+离子态存在.用接触角测试薄膜表面的浸润性,并计算其表面能.用血小板粘附实验研究不同含量Nd掺杂ZnO薄膜的血液相容性,其结果表明稀土钕掺杂后血小板的粘附数量和形变都较少,稀土掺杂和疏水性的提高是改善氧化锌薄膜抗凝血性能的主要原因.
Zinc oxide thin films doped with different neodymium(Nd) contents(1at%,2at% and 3at%) were grown on Si(100) substrates by radio frequency magnetron sputtering.X-ray diffraction(XRD) patterns show that all of the ZnO thin films have highly preferred growth along c-axis direction.The intensity of(002) diffraction peaks weakens and the gain size decreases with the increasing of Nd dopants.The optical transmittance of all the films exceeds 85% in the visible light region,and the optical band gap increases from 3.30 eV to 3.40 eV with the increasing of the Nd dopants.The surface chemical state of ZnO thin films is examined by X-ray photoelectron spectroscope(XPS),confirming that Nd element exists as Nd3+ in the films.Contact angle test is also employed to analyze the effect of Nd dopant on the wettability and surface energy.The platelets adhesion experiment shows that fewer platelets adhere and deform on ZnO and Nd doped ZnO thin films.Nd element and hydrophobility surface are the main factors leading to the better blood compatibility of ZnO thin films.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2011年第9期993-997,共5页
Journal of Inorganic Materials
基金
国家自然科学基金(81071264
30770588)
广东省自然科学基金(C010515)~~
关键词
氧化锌
钕
光电子能谱
血液相容性
zinc oxide
neodymium
X-ray photoelectron spectroscope
hemocompatibility