摘要
采用反应磁控溅射法在k9玻璃基底上沉积ZrO2薄膜。用轮廓仪、椭圆偏振仪和分光光度计,分别测试薄膜的厚度、折射率、消光系数和透过率,研究了不同氧流量对薄膜沉积速率和光学特性的影响。结果表明:随着氧气流量增加到22～24mL/min(标准状态下)时,沉积速率从6.8nm/s下降到2.5nm/s,并趋于稳定;在入射波长630nm处,薄膜的折射率为1.95,消光系数小于10-5;在可见及近红外波段,薄膜平均透过率高于80%。
ZrO2 thin films were deposited on k9 glass substrate by reaction magnetron sputtering. The film thickness, refractive index, extinction coefficient and transmittance were investigated by talysurf, ellipsometer and spectrophotometer, the influence of different oxygen flow on deposition rate and optical properties was discussed. The results show that the deposition rate decreases significantly from 6.8 nm/s to 2.5 nm/s and tend to be stable with the increasing of the oxygen flow between 22424 mL/min（standard state） ; The refractive index is 1.95 and the extinction coefficiem is less than 10^-5 at the wavelength 630 nm ;The average transmittance of ZrO2 films is higher than 80% in the spectrum of and near-infrared.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2011年第5期18-20,53,共4页
Surface Technology
关键词
ZRO2薄膜
反应磁控溅射
氧流量
光学特性
ZrO2 thin films
reaction magnetron sputtering
oxygen flow
optical characteristic
