离子束抛光工艺中驻留时间的综合算法

Dwell time algorithm of synthesis for ion beam polishing

在离子束抛光工艺中,驻留时间的求解是很关键的。通常求解驻留时间的时候,是用理想的高斯函数来近似实际的加工函数。如果使用实际的加工函数仿真加工,加工的效果不好。运用系数法和消去法的综合算法来提高采用实际加工函数仿真加工镜面面型的精度,首先多次用系数法得到比较理想且平滑的镜面面型,然后再用消去法精修面型。这种算法运算速度快,得到的面型精度高且较平滑。对这种综合算法进行仿真分析,比较了理想高斯函数与实际加工函数加工后的差别,同时比较了运用消去算法与综合算法得到的镜面面型,PV值由83.63nm减小到46.92nm,镜面精度提高了很多。

In the process of ion beam polishing,the determination of dwell time is very crucial.Usually the ideal Gauss function is used to approximate the practical processing function.If the practical processing function is used to simulate processing,the result of processing is not satis-facotry.A synthesis algorithm of coefficient method and elimination method is proposed to improve the accuracy of mirror face when the practical processing function is adopted to simulate processing.Firstly,it uses the coefficient method iteratively to get a smooth mirror face,and then uses the elimination method to improve the accuracy.This algorithm runs faster,and works out a smooth mirror face with high accuracy.The synthesis algorithm is simulated,the results between the ideal Gauss function and the practical processing function are compared,as well as the mirror faces obtained by elimination method and synthesis method.The simulation results show that,compared with the 83.36 nm PV value of the practical processing function without the synthesis algorithm,the one with the synthesis algorithm is decreased to 46.92 nm,and the accuracy of mirror face is improved.