期刊文献+

Structural, electrical, and optical properties of ZnInO alloy thin films

Structural, electrical, and optical properties of ZnInO alloy thin films
下载PDF
导出
摘要 Indium zinc oxide (IZO) thin films with different percentages of In content (In/[In+Zn]) are synthesized on glass substrates by magnetron sputtering, and the structural, electrical and optical properties of IZO thin films deposited at different In2O3 target powers are investigated. IZO thin films grown at different In2O3 target sputtering powers show evident morphological variation and different grain sizes. As the In2O3 sputtering power rises, the grain size becomes larger and electrical mobility increases. The film grown with an In2O3 target power of 100 W displays the highest electrical mobility of 13.5 cm.V-1-s-1 and the lowest resistivity of 2.4× 10^-3 Ω.cm. The average optical transmittance of the IZO thin film in the visible region reaches 80% and the band gap broadens with the increase of In2O3 target power, which is attributed to the increase in carrier concentration and is in accordance with Burstein-Moss shift theory. Indium zinc oxide (IZO) thin films with different percentages of In content (In/[In+Zn]) are synthesized on glass substrates by magnetron sputtering, and the structural, electrical and optical properties of IZO thin films deposited at different In2O3 target powers are investigated. IZO thin films grown at different In2O3 target sputtering powers show evident morphological variation and different grain sizes. As the In2O3 sputtering power rises, the grain size becomes larger and electrical mobility increases. The film grown with an In2O3 target power of 100 W displays the highest electrical mobility of 13.5 cm.V-1-s-1 and the lowest resistivity of 2.4× 10^-3 Ω.cm. The average optical transmittance of the IZO thin film in the visible region reaches 80% and the band gap broadens with the increase of In2O3 target power, which is attributed to the increase in carrier concentration and is in accordance with Burstein-Moss shift theory.
机构地区 Department of Physics
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第10期340-344,共5页 中国物理B(英文版)
基金 supported by the National Natural Science Foundation of China (Grant No. 10974174) the Natural Science Foundation of Zhejiang Province of China (Grant Nos. Z6100117, Z1110057, and Y4080171)
关键词 indium-zinc oxide magnetron sputtering In content optical properties electrical prop-erties indium-zinc oxide, magnetron sputtering, In content, optical properties, electrical prop-erties
  • 相关文献

参考文献22

  • 1Sasabayashi T, Ito N, Nishimura E, Kon M, Song P K, Ut- sumi K, Kaijo A and Shigesato Y 2003 Thin Solid Films 445 219.
  • 2Wang A C, Dai J Y, Cheng J Z, Chudzik M P, Marks T J, Chang R P H and Kannewurf C R 1998 Appl. Phys. Lett. 73 327.
  • 3Holmelund E, Schou J, Tougaard S and Larsen N B 2002 Appl. Surf. Sci. 197 467.
  • 4Zhong W W, Liu F M, Cai L G, Zhou C C, Ding P and Zhang H A 2010 Chin. Phys. B 19 107306.
  • 5Naghavi N, Rougier A, Marcel C, Guery C, Leriche J B and Tarascon J M 2000 Thin Solid Films 360 233.
  • 6Lim W, Wang Y L, Ren F, Norton D P, Kravchenko I I, Zavada J M and Pearton S J 2008 Appl. Surf. Sci. 254 2878.
  • 7Luna-Arredondo E J, Maldonado A, Asomoza R, Acosta D R, Melendez-Lira M A and Olvera M D L 2005 Thin Solid Films 490 132.
  • 8Aw K C, Tsakadze Z, Lohani A and Mhaisalkar S 2009 Scr. Mater. 60 48.
  • 9Dupont L, Maugy C, Naghavi N, Guery C and Tarascon J M 2001 J. Sol. St. Ch. 158 119.
  • 10Naghavi N, Marcel C, Dupont L, Rougier A, Leriche J B and Guery C 2000 J. Mater. Chem. 10 2315.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部