专利计量指标研究述评

Review on Patentometrics' Indicators

就当前国内外主要的专利计量指标,从适用性的角度将其划分为宏观、中观和微观三个层次,并就其计算方法和表征意义进行详细介绍。通过分析发现,专利指标主要从量、率和质的角度,体现宏观技术领域、中观具体企业和微观专利文献方面的差异。最后,对当前专利计量指标应用过程中存在的一些问题进行探讨,尤其是对我国专利计量中存在的一些独特问题进行较为深入的剖解,希望可以对相关政策制定和产业布局规划提供一定的参考。

From the applicable perspective in patentometrics, the authors divide the patent indicators in macro level, meso level and micro level, then introduce their calculated methods and their potential meanings in different levels. Based on the analysis, the indicators showed the differences among the macro technology domain, the meso technology corporation and the micro patent document by the changes in quantity, ratios and quality. After that, the authors discuss the problems existed in the patentometrics, especially attention paid to the particular phenomenon in their database, so as to provide references to the policy-maker for industry distribution, corporation management and so on.