溅射功率对沉积纳米TiO_2织物光催化性能的影响

Effects of sputtering power on photocatalytic properties of TiO_2 deposited fabrics

室温条件下采用直流磁控反应溅射技术在涤纶纺黏非织造织物表面生长二氧化钛(TiO2)薄膜。采用X射线光电子能谱仪、X射线衍射仪和原子力显微镜对不同溅射功率条件下所制备TiO2薄膜的结构和表面形貌进行表征,研究溅射功率对薄膜沉积速率以及沉积纳米TiO2织物光催化性能的影响。实验表明:在一定范围内,溅射功率对沉积薄膜的化学结构影响不大;溅射功率增加,薄膜的沉积速率和溅射效率提高,薄膜均匀性、致密性增加,沉积纳米TiO2织物的光催化性能提高,但过高的溅射功率使靶材出现过温,不仅使薄膜沉积速率降低,均匀性下降,而且易损伤靶材。

Nanoscale titanium dioxide（TiO2） functional films were prepared on the surface of spun-bonded nonwoven polyester fabric at room temperature by DC reactive magnetron sputtering process.The surface morphology and the structural properties of TiO2 films deposited under different sputtering powers were characterized by X-ray photoelectron spectroscopy,X-ray diffraction and atomic force microscopy.The deposition rate and photocatalytic properties of the fabrics with TiO2 films prepared under different sputtering powers were analyzed.The test results showed that as the sputtering power increased within a certain range,the deposition rate and sputtering efficiency increased,the uniformity and compactness of the TiO2 films improved,and the photocatalytic activity of the polyester nonwoven fabric with TiO2 films enhanced,with little influence on chemical structure of the TiO2 films.However,if the sputtering power was too high,it could lead to not only overheating and damage of the target,but decrease of the deposition rate and uniformity of TiO2 films.