多孔Cu_2O/SnO_2复合薄膜的制备及其可见光催化降解罗丹明B的性能

Preparation of Porous Cu_2O/SnO_2 Compound Films for Visible Light Degradation of Rhodamine B

采用浸渍-沉积方法在电沉积的多孔Cu薄膜上修饰一层纳米SnO_2,经低温热氧化处理制备出多孔Cu_2O/SnO_2复合多层薄膜。运用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、X-射线粉末衍射仪(XRD)、紫外可见漫反射光谱(UV-vis DRS)和荧光光谱(FS)技术表征了薄膜的结构、形貌和光学性质。测试了薄膜在可见光下降解罗丹明B(RhB)的性能。结果表明,在30℃的0.2 mol/L CuSO_4+1.5 mol/L H_2SO_4镀液中,以1.5 A/cm^2电流沉积20 s得到的多孔Cu薄膜,在SnO_2溶胶中浸渍10 s并重复5次,再经空气气氛下100℃焙烧30 min,制得的多孔复合薄膜显示良好的可见光催化降解RhB的性能。

The dip-deposited method was used to coat the self-made SnO2 sol on the porous Cu films electrodeposited. And the porous Cu2O/ SnO2 films were prepared by heated the films in air. The porous films were characterized with scanning electron microscopy（SEM） ,Transmission Electron Microscope （ TEM ）, X-ray diffractometry （ XRD）, UV-vis diffuse reflectance spectroscopic （ UV-vis DRS ） and Fluorescenee Spectrometer（FS）. The photocatalytic performance of porous Cu2O/SnO2 films were tested through photedegradation of rhodamine B illuminated with visible light. The results reveal that the porous films shown excellent activity of visible light photocatalytic degradation of rhodamine B. And the optimal condition for preparation of the Cu2O/SnO2 films are that the porous Cu films electrodeposited in a solution containing 0. 2 moL：L CuSO4,1.5 mol/L H2SO4 at 30 ℃, and at 1.5 A/cm^2 for 20 s, then diped in the self-made SnO2 sol for 10s and 5 times repeat- edly,follow by heated at 100 ℃ for 30 rain in air.