期刊文献+

微喇曼和红外光谱法研究化学气相沉积金刚石多晶膜结晶质量特性 被引量:1

Optical Characterization of Chemical Vapor Deposited Large-grained Polycrystalline Diamond Films by Raman and Infrared Spectroscopy
下载PDF
导出
摘要 研究了化学气相沉积多晶膜的宏观性能(颜色和透光性)与微观性能(结晶质量、相纯度和氢杂质含量)之间的关系,喇曼谱与金刚石膜中氢杂质含量(红外光谱测得)的关联性.给出了根据颜色和透明度来区分样本膜质量的实验依据,颜色较深的膜的结晶质量差、相纯度低、氢杂质含量高,1 332cm-1金刚石特征喇曼峰强度低,半峰宽大.由于多晶膜生长不均匀性、多晶以及粗糙度的影响,生长面的微喇曼光谱随采样点变化会产生较大的偏差,而光滑生长界面的喇曼光谱随采样点的变化偏差较小,因此生长界面的喇曼光谱更能反映化学气相沉积法制备金刚石膜的整体质量. The relation between macro-properties and micro-quantities of the large-grained polycrystalline chemical vapour deposited diamond films was investigated. Considering the growth non-uniformity, the micro-Raman spectra measured on the top growth surface show large variation from spot to spot. Whereas, the micro-Raman spectra taken on the fine-grained smooth interface of the diamond films show that small deviation and generally can represent the overall quality of the large-grained polyerystaline diamond films, and correlate well with hydrogen content of the film measured by Fourier-transform infrared spectroscopy. It can be concluded that a diamond film with darker color or lower transparency has lower quality and lower phase purity characterized by the larger full width at half maximum (FWHM) and lower intensity of the diamond Raman peak around 1 332 cm^-1.
出处 《光子学报》 EI CAS CSCD 北大核心 2011年第10期1509-1513,共5页 Acta Photonica Sinica
基金 国家自然科学基金(No.10874021) 江苏省教育厅项目(No.06kja43014)资助
关键词 结晶质量 多晶金刚石膜 傅里叶变换红外光谱 微喇曼 微波等离子体化学气相沉积法 Crystalline quality Polycrystalline diamond films Fourier transform infrared spectroscopy Miero-Raman spectroscopy Chemical vapor deposition
  • 相关文献

参考文献12

  • 1BUTLER J E, MANKELEVICH Y A, CHEESMAN A, et al. Understanding the chemical vapor deposition of diamond recent progress[J]. J Phys: Condens Matter, 2009, 21:364201(20pp).
  • 2刘丽丽,邓玉福.外延法生长金刚石薄膜场发射特性研究[J].光子学报,2009,38(6):1349-1352. 被引量:7
  • 3HAQUE M S, NASEEM H A, SHUI.TZ J L, et al. Comparison of infrared, Raman, photoluminescence, and xray photoelectron spectroscopy for characterizing are-jetdeposited diamond films[J]. J Appl Phys, 1998, 83 (8): 4421-4429.
  • 4TANG C J, NEVES A J, CARMO M C. Characterization of chemical vapor deposited diamond films: correlation between hydrogen incorporation and film morphology and quality[J]. J Phys: Conden.sMatter, 2005, 17:1687-1695.
  • 5杜康,徐伟,贺中信,吴智量,彭军.氢气浓度对MPCVD金刚石膜色度的影响[J].光散射学报,2009,21(2):152-156. 被引量:2
  • 6HAOUNI A, MERMOUX M, MARCUS B, et al. Confocal Raman imaging for the analysis of CVD diamond films[J]. DiamondRelat Mater, 1999, 8(2-5): 657-662.
  • 7MOSSBRUCKER J, ASMUSSEN J. 3-D determination of the location and absolute amount of sp(e) and sp(3) bound carbon and stress components in CVD diamond films using multi-color polarized Raman spectroscopy [J]. Diamond Relat Maier, 1999, 8(2-5): 663-667.
  • 8李博,韩柏,吕宪义,李红东,汪剑波,金曾孙.微波PCVD法大尺寸透明自支撑金刚石膜的制备及红外透过率(英文)[J].新型炭材料,2008,23(3):245-249. 被引量:14
  • 9YAN Y F, LI J B, WEI S H, et al. Possible approach to overcome the doping asymmetry in wideband gap semiconductors[J]. Phys Rev Lett, 2007, 98: 135506(3pp).
  • 10YAN C X, DAI Y, LONG R, et al. Effect of excess hydrogen on the electronic properties of passivated diamond [J]. JPhy.; Chem Solids;, 2009, 70(2): 307-311.

二级参考文献30

共引文献18

同被引文献18

  • 1杨胶溪,段晓峰,吕反修,左铁钏,王凤莲.黑色组织对直流电弧等离子体喷射金刚石自支撑膜光学、热学性能的影响[J].红外技术,2005,27(2):175-178. 被引量:5
  • 2苏青峰,夏义本,王林军,刘健敏,史伟民.不同取向金刚石薄膜的红外椭圆偏振光谱特性研究[J].红外与毫米波学报,2006,25(2):86-89. 被引量:6
  • 3李跃龙,黎建明,苏小平,杨海,那木吉拉图,李楠,杨鹏,李金权.红外窗口和整流罩材料研究现状与发展趋势[J].人工晶体学报,2007,36(4):877-884. 被引量:31
  • 4Gracio J J, Fan Q H, Madaleno J C. Diamond growth by chemical vapour deposition [ J ]. Journal of Physics D : Applied Physics, 2010, 43 (37) : 374017.
  • 5Ralchenko V G, Smolin A A, Konov V I, Sergeichev K F, Sychov I A, Vlasov I I, Migulin V V, Voronina S V, Khomich A V. Large-area diamond deposition by mi- crowave plasma [ J ]. Diamond and Related Materials,1997, 6(2). 417.
  • 6Tang C J, Neves A J, Fernandes A J S. Influence of nucleation density on film quality, growth rate and mor- phology of thick CVD diamond films [ J]. Diamond and Related Materials, 2003, 12(9) : 1488.
  • 7Ding M Q, Li L L, Feng J J. A study of high-quality freestanding diamond films grown by MPCVD [ J ]. Ap- plied Surface Science, 2012, 258(16) : 5987.
  • 8Posthill J B, Malta D P, Humphreys T P, Hudson G C, Thomas R E, Rudder R A, Markunas R J. Method of fabricating a free-standing diamond single crystal using growth from the vapor phase [J]. J. Appl. Phys., 1996, 79(5): 2722.
  • 9Inspektor A, Liou Y, McKenna T, Messier R. Plasma CVD diamond deposition in C-H-O systems [ J]. Surface and Coatings Technology, 1989, 39 : 211.
  • 10Das D, Singh Raj N, Barney I T, Jackson A G, Mukho- padhyay S M. Effect of oxygen on growth and proper- ties of diamond thin film deposited at low surface temper- ature [ J ]. Journal of Vacuum Science and Technology A, 2008, 26(6): 1487.

引证文献1

二级引证文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部