摘要
详细介绍了如何选择满足CMP抛光机硅片传输系统要求的六维机械手,并基于所选择的六维机械手配合换枪盘、末端执行器构建了硅片干进湿出式传输系统,最终利用示教盒示教出一条无碰撞、姿态合理的运动路径。
This paper introduces how to choose the conformable six-axis robot,used for Wafer transfer system in CMP.We constructing the wafer Dry-in-Wet out transfer system based on the selected six-axis robot,tool changers and end effector.Finally teach out a collision-free,the reasonable attitude path by means of the teaching box.
出处
《电子工业专用设备》
2011年第10期15-18,共4页
Equipment for Electronic Products Manufacturing
