高密度螺旋波等离子体源的应用进展

Application Progresses of High-Density Helicon Wave Plasma Sources

首先介绍了螺旋波的定义、螺旋波等离子体源产生等离子体所需条件的工作范围以及螺旋波等离子体源主要的一些应用。按照所加磁场范围的不同(分为在磁感应强度为100～1 600Gs和在强磁场中两部分),分别进一步讨论了国内外各研究小组研制的等离子体源的运行参数及技术特点。随后介绍了螺旋波等离子体源在刻蚀、薄膜沉积和火箭推进三个方面的应用进展。其中重点介绍了螺旋波等离子体火箭推进。最后简单展望了螺旋波等离子体源的应用前景,并指出其发展中尚待解决的一些问题。

The definition of helicon waves,the required working range of the helicon wave plasma source to generate the plasma and some of the main applications for the helicon wave plasma source are introduced.According to different ranges of applied magnetic field（in the range of 100-1 600 Gs magnetic field and in the strong magnetic field）,the operating parameters and technical characteristics of the plasma sources developed by the research teams at home and abroad are further discussed,respectively.Then the application progresses of the helicon wave plasma source in etching,thin film deposition and rocket propulsion are introduced,with the emphasis on the helicon wave plasma rocket propulsion.Finally,the application prospect of the helicon wave plasma source is forecasted simply,and some issues to be resolved in development of the helicon wave plasma source are pointed out.