离子束辅助沉积法制备TiAlN/TiB_2纳米多层膜的研究

Synthesis and characterization of TiAlN/TiB_2 multilayers prepared by ion beam assisted deposition

运用离子束辅助沉积法(IBAD)制备了一系列具有不同调制比例的TiAlN/TiB2纳米多层膜,利用X射线衍射(XRD)、扫描电子显微镜(SEM)和纳米压痕等表征手段研究了薄膜调制比例对其硬度、内应力和膜基结合力等力学性质的影响.结果表明:随着调制比例从8∶1变化到25∶1,多层膜的硬度在29～34 GPa之间变化,所有多层膜的硬度均高于TiAlN和TiB2两种各体层材料通过混合法则得的结果,结合XRD结果分析认为,TiAlN(111)择优取向是薄膜硬度升高的一个重要原因.

Alternate TiAlN/TiB2 hard multilayers with modulation ratio（the thickness ratio of TiAlN and TiB2 layers,tTiAlN∶tTiB2） ranging from 8∶1 to 25∶1 were prepared by using ion beam assisted deposition（IBAD）.The effect of modulation ratio on the hardness,adhesion,and stress were investigated using various characterization techniques including XRD,SEM and nano indentation.It was found that the hardness increased from 29 GPa to 34 GPa with increasing tTiAlN∶tTiB2 of 8∶1 to 25∶1.All multilayers displayed higher hardness than individual TiAlN and TiB2 layers.Strong TiAlN（111） crystallographic texture as well as multilayer structure should be responsible for the hardness increasing of TiAlN /TiB2 multilayers.